NOVELTY - The electrically conductive film has a metal layer that is set with a regular mesh-like structure or an irregular random mesh-like structure, and formed on a resin substrate which is able to undergo elastic deformation. The stress relaxation rate and residual strain rate of the metal layer are set to satisfy preset relationship during undergoing tensile-compression test. The portion of the film is set with a thickness of 50 micrometer, width of 4 mm and length of 25 mm.    USE - Electrically conductive film for use in display, touch sensor and solar cell (all claimed). Can also be used in medical application, automotive application, optical application, electronic application and adhesive application.    ADVANTAGE - The stress relaxation rate and residual strain rate of the metal layer are set to satisfy preset relationship during undergoing tensile-compression test, thus the elastic recoverability and stress relaxation properties of the electrically conductive film is improved.    DETAILED DESCRIPTION - The portion of the film is subjected to an extension process and a restoration process using a tensile compression tester in accordance with ISO 3384. The stress relaxation rate and the residual strain rate are calculated using the calculation methods. The deflection correction is carried out at a force of less than or equal to 0.05 N, when the test piece is attached to a clamp. The testing speed is set to 25 mm/min, temperature conditions are set to 23 degrees C and extension/holding conditions are set for 5 minutes at 25% extension, during performing extension process. The testing speed is set to 0.1 mm/min until the tensile force reaches 0 plus minus 0.05 N, and temperature conditions are set to 23 degrees C. The stress relaxation rate calculation method involves measuring the initial tensile force at the point, when the extension process is completed. The amount of strain is maintained for 5 minutes under the extension/holding conditions, after the tensile force is measured. The residual strain rate calculation method involves measuring the amount of strain at the point where the tensile force in the restoration process reaches 0 plus minus 0.05 N. The resin substrate is contained with a thermosetting resin formed with epoxy resin. The area covered by the metal in the metal layer is 5 to 80%. The thickness of the metal layer is less than or equal to 10 micrometer and the minimum line width of the metal layer is greater than or equal to 0.1 micrometer. A portion or all of the portions of the metal layer is embedded in the resin substrate that is able to undergo elastic deformation. A resin layer is set with a composition that is different from the resin of the resin substrate layer, and formed between the metal layer and the resin substrate layer. The conductive film is set with more than or equal to 70% of total light transmittance. An INDEPENDENT CLAIM is included for a patterned electrically conductive film obtained by partially removing the metal layer in the electrically conductive film.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the regular mesh-like structure of a metal layer.