TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The barrier stack further comprises a tie layer, where the decoupling layer is on the tie layer. The decoupling layer comprises a cured solvent solution, where the solvent solution prior to cure comprises a solvent; a silyl monomer represented by (X1)3-Si-Ar'-Si-(X2)3 and silicone monomers selected from monomers represented by SiX3X4R14R15, SiX5X6X7R16, and SiX8X9X10X11.Ar'=a substituted or unsubstituted 6-30C arylene group;X1 and X2=independently a 1-6C alkoxy group, a hydroxyl group, halogen, a carboxyl group, or its combination;R14-R16=bonded to the silicon atom, and independently hydrogen, a substituted or unsubstituted 1-6C alkyl group, a substituted or unsubstituted 3-20C cycloalkyl group, a substituted or unsubstituted 6-20C aryl group, a substituted or unsubstituted 7-20C arylalkyl group, a substituted or unsubstituted 1-20C heteroalkyl group, a substituted or unsubstituted 2-20C heterocycloalkyl group, a substituted or unsubstituted 2-20C alkenyl group, a substituted or unsubstituted 2-20C alkynyl group, a substituted or unsubstituted 1-6C alkoxy group, a substituted or unsubstituted carbonyl group, a hydroxy group, or its combination; andX3-X11=bonded to the silicon atom, and each independently a 1-6C alkoxy group, a hydroxy group, a halogen, a carboxyl group, or its combination.The decoupling layer comprises a cured solvent solution, where the solvent solution prior to cure comprises a solvent, a first moiety represented by asterisk-Si-Ar'-Si-asterisk; and one or more second moieties represented by R1R2SiO(2-c/2)(OR(III))c; R3SiO(3-d/2)(OR(IV))d; or R6R7R8SiO1/2.asterisk=a group linkable to one of the second moieties.The solvent solution further comprises a polymerization initiator. Preferred Composition: The silyl monomer is present in the solvent solution in an amount of 0.01-20 wt.% based on 100 wt.% of the silyl monomer and the silicone monomer. It is present in the solvent solution in an amount of 80-99.9 wt.% based on 100 wt.% of the silyl monomer and the silicone monomer. Preferred Process: Making barrier stack further involves forming a tie layer between the substrate and the decoupling layer. Depositing the solvent solution on the substrate involves a non-vacuum deposition technique. Curing the solvent solution involves thermal curing, UV radiation, or electron beam treatment. Preferred Definitions:    R(I)-R(IV) and R1-R8=each independently hydrogen, a substituted or unsubstituted 1-10C alkyl group, a substituted or unsubstituted 3-20C cycloalkyl group, a substituted or unsubstituted 1-10C hydroxyalkyl group, a substituted or unsubstituted 6-20C aryl group, a substituted or unsubstituted 2-20C heteroaryl group, a substituted or unsubstituted 2-10C alkenyl group, a substituted or unsubstituted 1-10C alkoxy group, a lactone group, a substituted or unsubstituted carboxyl group, a substituted or unsubstituted glycidylether group, a hydroxyl group, or its combination.