NOVELTY - Method of producing bi-layer anti-reflection coating with scratch resistance property on substrate involves successively performing step (a) of cleaning substrate thoroughly with mild detergent solution, rinsing with water, followed by deionized water, and then drying at 100 degrees C for 10-15 minutes in air-oven, and step (b) of coating cleaned substrate with high refractive index sol selected from titania or zirconia for formation of bottom layer (1st layer) using organo-metallic precursors consisting of titanium alkoxide or zirconium alkoxide, and 1 low and 1 high boiling point solvent.    USE - Method of producing bi-layer anti-reflection coating for store front windows, display cases, solar absorber tubes, and photovoltaic devices for harnessing solar energy (all claimed).    ADVANTAGE - The coating exhibits excellent anti-reflection property and scratch resistant property.    DETAILED DESCRIPTION - Method of producing bi-layer anti-reflection coating with scratch resistance property on substrate involves successively performing step (a) of cleaning substrate thoroughly with mild detergent solution, rinsing with water, followed by deionized water, and then drying at 100 degrees C for 10-15 minutes in air-oven, step (b) of coating cleaned substrate with high refractive index sol selected from titania or zirconia for formation of bottom layer (1st layer) using organo-metallic precursors consisting of titanium alkoxide or zirconium alkoxide, and 1 low and 1 high boiling point solvent, such as alcohol, step (c) of drying coated substrate at 100 degrees C for 1 hour in oven, step (d) of coating dried substrate with low refractive index composite sol selected from silicon dioxide (SiO2)-mercaptopropyl trimethoxysilane (MPTS) or SiO2-zirconium oxide (ZrO2) or SiO2-titanium oxide (TiO2) for formation of top layer (2nd layer) using mixture of organo metallic precursors consisting of silicon alkoxide as major part, titanium alkoxide or zirconium alkoxide, or silane compounds (MPTS or others), and 1 low and 1 high boiling point solvent, such as alcohol, hydrochloric acid (HCl), and water (H2O), and step (e) of drying coated substrate at 100 -120 degrees C for 0.5-1 hour in oven and curing at 500-550 degrees C for 2-4 hours at heating rate of 5-10 degrees C/minute. An INDEPENDENT CLAIM is included for anti-reflective coating with scratch resistant property capable of being applied on substrate, such as glass and or silicon wafer, which comprises greater than or equal to 2 layers, an inner layer containing compound of TiO2 or ZrO2 (high refractive index layer) and a top layer containing major portion of low refractive index SiO2 compound and smaller portion of TiO2 or ZrO2 or silane compound.    DESCRIPTION OF DRAWING(S) - The drawings show cross-sectional views of transparent glass or silicon wafer substrate on which 6 different bi-layer anti-reflection coatings are deposited.