TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic barrier layer is a metallic-nonmetallic alloy compound, metallic or nonmetallic oxide, metallic or nonmetallic fluoride, metallic or nonmetallic nitride, metallic or nonmetallic carbide, metallic or nonmetallic oxynitride, metallic or nonmetallic boride, and/or metallic or nonmetallic silicide. The metal or non-metal is silicon, aluminum, selenium, zinc, antimony, indium, germanium, tin, bismuth, transition metal or lanthanide metal.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The photocurable composition comprises mixture of Type A mono(meth)acrylate cyano group-containing silicon-based photocurable monomer and Type A di(meth)acrylate cyano group-containing silicon-based photocurable monomer. The photocurable composition further comprises cyano-free silicon-based photocurable monomer (C) for formula: R11-Si(-R10)(-R12)-O-Si(-R13)(-R14)-R15 (II) and non-silicon-based photocurable monomer (D). The solid content of component (A) and component (B) with respect to total content of components (A and B) is 1-99 wt.% and 1-99 wt.%, respectively. The solid content of component (A), component (B) and component (D) with respect to total content of components (A, B and D) is 40-55 wt.%, 1-5 wt.% and 40-55 wt.%, respectively. The solid content of component (A), component (B) and component (C) with respect to total content of components (A, B and C) is 40-55 wt.%, 1-5 wt.% and 40-55 wt.%, respectively. The solid content of component (A), component (B), component (C) and component (D) with respect to total content of components (A, B, C and D) is 40-55 wt.%, 1-5 wt.%, 35-45 wt.% and 5-15 wt.% respectively. The component (A) is chosen from 2-(((3-cyanopropyl)(methyl)(2-((2-methylpropanoyl)oxy)ethoxy)silyl)oxy)ethyl 2-methylprop-2-enoate, 2-(((3-cyanopropyl)((2-((2-methylpropanoyl)oxy)ethoxy))phenylsilyl)oxy)ethyl 2-methylprop-2-enoate, 4-(((3-cyanopropyl)(methyl)(4-(prop-2-enoyloxy)butoxy)silyl)oxy)butyl prop-2-enoate, and 2-(((3-cyanopropyl)dimethylsilyl)oxy)ethyl 2-methylprop-2-enoate.R10-R15=1-10C alkyl, 1-10C heterocyclyl, 2-20C alkenyl, 2-18C heteroaryl, 2-18C heteroarylalkenyl, 6-20c aryl, 4-20C heteroaryl, 1-10C alkoxy, 1-10C silyl, 1-10C silyloxy (all optionally substituted), H or -Z-O-C(=O)-C(-CH2)-R4, in which at least one of R10-R15 is Z-O-C(=O)-C(-CH2)-R4;R4=H or 1-5C alkyl;andZ=1-10C alkylene, 1-10C heteroarylalkylene, 2-18C alkenyl, 2-18C alkenylene, 6-20C arylene, 4-20C heteroaryl, 1-10C alkoxy (all optionally substituted), or single bond.