NOVELTY - Method for isolating flexible film (16) from support substrate (10) involves surface-treating top surface of substrate to form top surface (15) with detachment characteristics, forming flexible film on top surface, and isolating flexible film from support substrate. The surface treatment of the top surface is performed using chemical agent chosen from carbon/silicon/germanium-containing compound (I), amine compound (II), sulfur/selenium-containing compound (III), carbon/sulfur-containing compound (IV), phosphorus-containing compound (V) and sulfone compound (VI).    USE - Method for isolating flexible film from support substrate (claimed). Uses include but are not limited to transistor arrays, memory elements, flat panel displays, solar cells and semiconductor currents.    ADVANTAGE - The method enables simple, efficient and economical isolation of flexible film from support substrate using chemical agent with excellent thermal resistance which does not release gas during heating process.    DETAILED DESCRIPTION - Method for isolating flexible film from support substrate involves providing a support substrate with a top surface, surface-treating the top surface of the support substrate to form a top surface with detachment characteristics, forming a flexible film on the top surface of the support substrate, and isolating the flexible film from the support substrate. The surface treatment of the top surface is performed using chemical agent chosen from carbon/silicon/germanium-containing compound of formula (I), amine compound of formula (II), sulfur/selenium-containing compound of formula (III), carbon/sulfur-containing compound of formula (IV), phosphorus-containing compound of formula (V) and sulfone compound of formula (VI).    W'=C, Si, or Ge;    X=S or Se;    Y'=C or S;    R1-R3=H, alkenyl, alkyl or -OR;    R=1-18C alkyl;    R4=F, Br, I, carboxy, amino, cyano, amido or haloalkyl;    R5=Li;and    R6-R8=F, Cl, Br, I, alkenyl, alkyl, carboxy, amino, cyano, amido or haloalkyl.    DESCRIPTION OF DRAWING(S) - The drawing shows cross-sectional view illustrating method for isolating flexible film from a support substrate.    Support substrate (10)    Top surface with detachment characteristics (15)    Flexible film (16)