NOVELTY - A thermal, acid, and/or solvent resistant metal organic framework comprises linked secondary binding units (Ia). The framework is thermally stable when exposed to temperature of 50-525 degrees C and/or framework is chemically stable in presence of solvent and/or acid.    USE - Thermal, acid, and/or solvent-resistant metal organic framework e.g. strong solid acid-type metal organic framework is used for thin film and membrane for device for storing and separating gas e.g. hydrogen, methane and natural gases, and catalytic device. Uses include but are not limited to respirator against toxic gas/vapor, adsorptive thermal battery, water supply and purification, proton conductor, photovoltaic device, and radioactive ion capture.    ADVANTAGE - The thermal, acid, and/or solvent resistant metal organic framework has high symmetry, diverse geometries, robustness and structural prediction.    DETAILED DESCRIPTION - A thermal, acid, and/or solvent resistant metal organic framework comprises linked secondary binding units of formula: M-O-L (Ia). The framework is thermally stable when exposed to temperature of 50-525 degrees C and/or framework is chemically stable in presence of solvent and/or acid.    M=metal, metal ion or metal-containing complex;    L=organic linking ligand comprising structure of formula (I)-(XXII) which undergoes condensation with metal, metal ion or metal-containing complex;    A1-A8=C, N, O, or S;    A9=group of formula (Ia)-(I-c);and    X1-X8,R1-R186=H, D, or FG, 1-20C alkyl, 1-19C heteroalkyl, 1-20C alkenyl, 1-19C heteroalkenyl, 1-19C alkynyl, 1-19C heteroalkynyl, 1-19C cycloalkyl, 1-19C cycloalkenyl, aryl, heterocyclyl or mixed ring system (all optionally substituted), in which adjacent R is linked together to form substituted ring chosen from cycloalkyl, cycloalkenyl, heterocyclyl, aryl or mixed ring system.    An INDEPENDENT CLAIM is included for production of strong solid acid-type metal organic framework, which involves reacting an organic linking ligand with zirconium or hafnium metal or metal ion at an elevated temperature for 2 hours or more, in presence of acid site precursor.