TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic salt is chosen from monobasic potassium phosphate, dipotassium hydrogen phosphate, monobasic sodium phosphate, disodium hydrogen phosphate, monobasic ammonium phosphate, dibasic ammonium phosphate, potassium hydrogen sulfate, sodium hydrogen sulfate and ammonium hydrogen sulfate. The content of inorganic salt is 0.1-10 wt.% with respect to 100 wt.% total content of the texture-etching solution composition.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The texture-etching solution composition further contains alkali compound chosen from potassium hydroxide, sodium hydroxide, ammonium hydroxide, tetrahydroxymethyl ammonium chloride and tetrahydroxyethyl ammonium chloride. The monomer further includes oxygen and sulfur atom in the ring structure. The monomer is chosen from N-vinyl pyrrolidone, N-acryloyl morpholine, N-vinyl succinimide, N-acryloxy succinimide, N-vinylcaprolactam, N-vinylcarbazole and N-acryloylpyrrolidine. Preferred Properties: The boiling point of the cyclic compound is 100 degrees C or more. The Hansen solubility parameter of the cyclic compound is 6-15. Preferred Process: The texture-etching method involves spraying the texture-etching solution composition on wafer at 50-100 degrees C for 30 seconds to 60 minutes, and/or immersing wafer in the texture-etching solution composition at 50-100 degrees C for 30 seconds to 60 minutes.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The texture-etching solution composition further comprises polysaccharide chosen from glucan compound, fructan compound, mannan compound, galactan compound and their metal salts. The glucan compound is chosen from cellulose, dimethylaminoethyl cellulose, diethylaminoethyl cellulose, ethylhydroxyethyl cellulose, methylhydroxyethyl cellulose, 4- aminobenzyl cellulose, triethylaminoethyl cellulose, cyanoethyl cellulose, ethyl cellulose, methyl cellulose, carboxymethyl cellulose, carboxyethyl cellulose, hydroxyethyl cellulose, hydroxypropyl cellulose, alginic acid, amylose, amylopectin, pectin, starch, dextrin, ( alpha )-cyclodextrin, ( beta )-cyclodextrin, ( gamma )-cyclodextrin, hydroxypropyl ( beta )-cyclodextrin, methyl-( beta )-cyclodextrin, dextran, dextran sulfate sodium, saponin, glycogen, zymosan, lentinan, and their metal salt. The texture-etching solution composition further comprises polymer obtained by polymerizing a monomer containing 4-10C ring structure substituted with nitrogen atom, and a cyclic compound. The content of polymer is 10-12 to 1 wt.% with respect to total content of the texture-etching solution composition. Preferred Properties: The weight-average molecular weight of the polymer is 1000-1000000. The boiling point of the polymer is 100 degrees C or more.