NOVELTY - The apparatus (1) has a chemical liquid supplying unit including a chemical liquid nozzle (4) which supplies chemical liquid onto a major surface of a substrate. A heater includes an annular infrared lamp (38) to be located in opposed relation to the major surface of the substrate held by a substrate holding unit to heat the chemical liquid supplied onto the major surface of the substrate by irradiation with infrared radiation emitted from the infrared lamp. A heater moving unit moves the heater along the major surface of the substrate held by the substrate holding unit.    USE - Substrate treatment apparatus for treating a major surface of a substrate e.g. semiconductor wafer, substrate for LCD device, substrate for plasma display device, substrate for field emission display (FED) device, substrate for optical disk, substrate for magnetic disk, substrate for magneto-optical disk, substrate for photo mask, ceramic substrate and substrate for solar cell, with hot chemical liquid i.e. resist lift-off liquid (claimed). Can also be used for sulfuric acid/hydrogen peroxide mixture (SPM) i.e. SPM liquid.    ADVANTAGE - The apparatus prevents atmosphere containing the chemical liquid droplets from entering the lamp housing so as to reliably avoid adversely influencing the infrared lamp. The apparatus can significantly improve resist lift-off efficiency, thus reducing time required for the resist removing process. The apparatus prevents the atmosphere from diffusing into the peripheral environment around the major surface of the substrate, thus avoiding contamination of the treatment chamber. The apparatus prevents temperature of the chemical liquid from being lowered in the region of the major surface of the substrate opposed to the opposed unit, so that the temperature of the chemical liquid present in the region opposed to an opposed unit can be increased.    DETAILED DESCRIPTION - The lamp housing is made of quartz. The chemical liquid supplying unit is a lift-off liquid supplying mechanism (13). The substrate holding unit is a wafer rotating mechanism (3).    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic block diagram of a substrate treatment apparatus.    Substrate treatment apparatus (1)    Wafer rotating mechanism (3)    Chemical liquid nozzle (4)    Lift-off liquid supplying mechanism (13)    Annular infrared lamp (38)