NOVELTY - Barrier stack comprises a decoupling layer comprising a siloxane polymer; and a barrier layer on the decoupling layer.    USE - The barrier stack is useful in electronic devices (e.g. organic light-emitting diodes (OLEDs), organic solar cells, and thin film solar cells).    ADVANTAGE - The siloxane polymer films produced from the solvent solutions exhibit improved resistance to plasma compared to traditional polymers used for decoupling layers in a barrier stack structure. In addition to improved plasma resistance, the polymers resulting from the solvent solutions exhibit good transparency in the visible and UV/vis spectra. Moreover, the polymer layers (or films) resulting from the solvent solutions exhibit good wettability of the underlying substrate (or device), enabling the manufacture of a substantially uniform, smooth film.    DETAILED DESCRIPTION - Barrier stack comprises a decoupling layer comprising a siloxane polymer of formula 2; and a barrier layer on the decoupling layer.    a, b, and d=0-2;    c and e=0-1; and    R(I)-R(IV) and R1-R8=each independently a hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted hydroxyalkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heteroaryl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted lactone group, a substituted or unsubstituted carboxyl group, a substituted or unsubstituted glycidyl ether group, a hydroxyl group, or its combination, where 0 not less than m not less than 0.9, 0 not less than n not less than 0.2, 0 less than or equal to p not less than 0.9, 0 not less than q not less than 0.9 and 0 less than or equal to r not less than 0.9, and m+n+p+q+r=1.    An INDEPENDENT CLAIM is included for a method of making a barrier stack which involves forming a decoupling layer comprising a siloxane polymer over a substrate by depositing a solvent solution comprising a solvent, a silyl monomer and one or more silicone monomers on the substrate, and curing the solvent solution, where the siloxane polymer comprises formula 2; and forming a barrier layer comprising an inorganic material over the decoupling layer; or a method of making a barrier stack which involves forming a decoupling layer comprising a siloxane polymer over a substrate by depositing a solvent solution comprising a solvent, a first moiety and second moieties on the substrate, and curing the solvent solution, where the siloxane polymer comprises formula 2; and forming a barrier layer comprising an inorganic material over the decoupling layer.