TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Substrate: The substrate is glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silver compound comprises silver nitrate. The acid scavenger comprises lithium hydroxide, disodium sulfide, calcium hydroxide and/or brine. The total amount of silver nitrate added to the reaction mixture is 1.5x 103 mole to 1 mole silver nitrate per liter of reaction mixture. The reaction is conducted in presence of 0.01-20 wt.% copolymer, based on the weight of the reaction mixture. The acid scavenger comprises base and/or buffering agent. The base comprises source of hydroxide ions and/or source of sulfide ions. The source of hydroxide ions is alkali metal hydroxide and/or alkaline-earth metal hydroxide. The source of hydroxide ions is alkali metal hydroxide comprising lithium hydroxide, sodium hydroxide, potassium hydroxide, rubidium hydroxide and/or cesium hydroxide. The source of hydroxide ions is alkaline-earth metal hydroxide comprising magnesium hydroxide, calcium hydroxide, strontium hydroxide and/or barium hydroxide. The source of sulfide ions is alkali-metal sulfide and/or alkaline-earth metal sulfide. The alkali-metal sulfide comprises lithium sulfide, sodium sulfide, potassium sulfide, rubidium sulfide and/or cesium sulfide. The alkaline-earth metal sulfide comprises magnesium sulfide, calcium sulfide, strontium sulfide and/or barium sulfide. The acid scavenger comprises buffering agent. The acid scavenger comprises lithium hydroxide and bicine.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The constitutional repeating unit (c1) comprises pyrrolidonyl moiety or pyrrolidinedionyl moiety. The constitutional repeating unit (c2) comprises cationic moiety. The ethylenically unsaturated cationic monomer is chosen from dimethylaminomethyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, di(t-butyl)aminoethyl (meth)acrylate, dimethylaminomethyl (meth)acrylamide, dimethylaminoethyl (meth)acrylamide, dimethylaminopropyl (meth)acrylamide, vinylamine, vinyl imidazole, vinylpyridine, vinylpyrrolidine, vinylpyrroline, vinylpyrazolidine, vinylpyrazoline, vinylpiperidine, vinylpiperazine, vinylpyridine, vinylpyrazine, vinylpyrimidine, vinylpyridazine, trimethylammonium ethyl (meth)acrylate salts, dimethylammonium ethyl(meth)acrylate salts, dimethylbenzylammonium (meth)acrylate salts, benzoylbenzyl dimethylammonium ethyl(meth) acrylate salts, trimethylammonium ethyl (meth)acrylamido salts, trimethylammonium propyl (meth)acrylamido salts, vinylbenzyl trimethyl ammonium salts and diallyldimethyl ammonium salts The polyol comprises ethylene glycol or glycerol. The buffering agent comprises 2-(N-morpholino)ethanesulfonic acid (MES), 2,2-bis(hydroxymethyl)-2,2',2"-nitrilotriethanol (Bis-Tris), N-(2-acetamido)iminodiacetic acid (ADA), N-(2-acetamido)-2-aminoethanesulfonic acid (ACES), 1 ,4-piperazinediethanesulfonic acid (PIPES), ( beta )-hydroxy-4-morpholinepropanesulfonic acid (MOPSO), 1 ,3-bis(tris(hydroxymethyl)methylamino)propane (Bis-Tris Propane), N,N-bis(2-hydroxyethyl)-2-aminoethanesulfonic acid (BES), 3-(N-morpholino)propanesulfonic acid (MOPS), 2-((2-hydroxy-1 ,1-bis(hydroxymethyl)ethyl)amino)ethanesulfonic acid (TES), 4-(2-hydroxyethyl)piperazine-1-ethanesulfonic acid (HEPES), 3-(N,N-bis(2-hydroxyethyl)amino)-2-hydroxypropanesulfonic acid (DIPSO), 4-(N-morpholino)butanesulfonic acid (MOBS), 2-hydroxy-3- (tris(hydroxymethyl)methylamino)-1-propanesulfonic acid (TAPSO), 2-amino-2-(hydroxymethyl)-1,3-propanediol (Trizma), 4-(2-hydroxyethyl)piperazine-1-(2-hydroxypropanesulfonic acid) (HEPPSO), piperazine-1,4-bis(2-hydroxypropanesulfonic acid) (POPSO), triethylamine (TEA), 4-(2-hydroxyethyl)-1-piperazinepropanesulfonic acid (EPPS), N-(tris(hydroxymethyl)methyl)glycine(tricine), diglycine (Gly-Gly), N,N-bis(2-hydroxyethyl)glycine (bicine), N-(2-hydroxyethyl)piperazine-N'-(4-butanesulfonic acid) (HEPBS), N-(tris(hydroxymethyl)methyl)-3-aminopropanesulfonic acid (TAPS), 2-amino-2-methyl-1 ,3-propanediol (AMPD), N-tris(hydroxymethyl)methyl-4-aminobutanesulfonic acid (TABS), N-(1 ,1-dimethyl-2-hydroxyethyl)-3-amino-2-hydroxypropanesulfonic acid (AMPSO), 2-(cyclohexylamino)ethanesulfonic acid (CHES), 3-(cyclohexylamino)-2-hydroxy-1-propanesulfonic acid (CAPSO), 2-amino-2-methyl-1-propanol (AMP), 3-(cyclohexylamino)-l -propanesulfonic acid (CAPS) and/or 4-(cyclohexylamino)-1-butanesulfonic acid (CABS). The polyol comprises glycerol. Preferred Process: Manufacture process further involves distilling polyol, before reacting polyol and silver compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The copolymer is random copolymer made by free radical polymerization of vinyl pyrrolidone, vinyl caprolactam, or vinyl pyrrolidone and vinyl caprolactam with ethylenically unsaturated cationic monomers. The copolymer is random copolymer made by free radical polymerization of monomer mixture comprising 80-100 pts. wt. vinyl pyrrolidone and 0-20 pts. wt. diallyldimethylammonium salt.