NOVELTY - The electrode has a transparent conductive film arranged on a substrate through a deposition process e.g. RF/DC sputtering process, ion beam sputtering deposition process, chemical vapor deposition (CVD) process, low pressure chemical vapor deposition (LPCVD) process, plasma chemical vapor deposition (PECVD) process, electron-beam evaporation process and ion plating process, with ion beam. Polymer is coated on the transparent conductive film and made of polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polyimide, poly-carbonate or PTFE.    USE - Transparent electrode for a solar cell, a touch panel and an OLED (all claimed).    ADVANTAGE - The electrode improves electric conductance and optical property of the transparent conductive film by performing an in-situ ion beam process without using a thermal process prevent heat generated in the substrate during the ion-beam process and reduce spacious obstacle in a chamber, so that production cost of the electrode can be reduced.    DETAILED DESCRIPTION - The substrate is made of glass, pyrex, quartz, polymer, silicone, sapphire or nitride. The ion beam comprises argon, nitrogen, oxygen, tetra-fluoromethane, hydrogen or helium. The transparent conductive film is made of indium-zinc-tin oxide, tin doped indium tri-oxide, zirconium doped indium tri-oxide, tungsten doped indium tri-oxide, molybdenum doped indium tri-oxide, niobium doped indium tri-oxide, germanium doped indium tri-oxide, silicon doped indium tri-oxide, gallium doped zinc oxide, aluminum doped zinc oxide, aluminum and gallium doped zinc oxide, niobium doped titanium dioxide, fluorine doped tin-oxide, aluminum doped tin-oxide or boron doped zinc oxide. INDEPENDENT CLAIMS are also included for the following:    (1) a transparent electrode manufacturing method    (2) a solar cell    (3) a touch panel    (4) an organic LED (OLED).    DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a transparent electrode manufacturing method.