NOVELTY - Protective film for use with a solar cell, preferably used as a protective coating being formed on anti-reflection layer of solar cell. The protective coating is made of one of an organic material and a phosphor-containing organic material. The organic material is selected from polyvinylidene fluoride (PVDF) resin, polymethyl methacrylate (PMMA) resin, silicone, and combination of silicone and PVDF resin.    USE - The protective film is used as protective coating being formed on anti-reflection layer of solar cell.    ADVANTAGE - The protective film dispenses with the need to make any change to a conventional solar cell-related semiconductor manufacturing process but only requires mixing the constituent ingredients of a material of which the protective coating on the anti-reflection layer is made, so as to enable ultraviolet to be partially converted into absorbable light and thus enhance the photovoltaic conversion efficiency. It augments the capability of solar cell to absorb and use ultraviolet and enhances the photovoltaic conversion efficiency of the solar cell without altering any conventional solar cell manufacturing process.    DETAILED DESCRIPTION - Protective film for use with a solar cell, preferably used as a protective coating being formed on anti-reflection layer of solar cell. The protective coating is made of one of an organic material and a phosphor-containing organic material. The organic material is selected from polyvinylidene fluoride (PVDF) resin, polymethyl methacrylate (PMMA) resin, silicone, and combination of silicone and PVDF resin. Phosphor in the phosphor-containing organic material is a down-converted phosphor being one of JQX(PO4)2:X3+ and JQX(PO4)2:X2+, X2+.    X=any rare earth metal;    J=one of lithium, sodium, and potassium; and    Q=any alkaline earth metal.    An INDEPENDENT CLAIM is included for a solar cell for use with the protective film comprising a semiconductor substrate, an anti-reflection layer on the semiconductor substrate, a rear conductive aluminum layer below the semiconductor substrate, a front conductive electrode, and a rear conductive electrode, where the protective film is a protective coating formed on the anti-reflection layer.