TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The photoacid generator is nonionic photoacid generator whose molar extinction coefficient is 4000 L/(mol.cm) or more at 365 nm, and generates acid having pKa of less than -6 by irradiation of actinic light or radiation. The nonionic photoacid generator is a compound containing 2C or 3C fluoroalkyl group, compound capable of generating sulfonic acid containing 2C or 3C fluoroalkyl group by irradiation of actinic light and/or radiation, sulfonic acid group-containing compound of formula (3), compound containing 5-membered imide sulfonate group, methanesulfonate group-containing compound of formula (4) or compound containing an oxime sulfonate group. The chemically-amplified-type photosensitive resin composition further contains a basic compound. The basic compound is primary amine compound.R6=2C or 3C fluoroalkyl;R7=alkylenyl, alkenylenyl or arylenyl;R8=2C or 3C fluoroalkyl;R9=1-8C alkyl or fluoroalkyl;andR10=aryl or heteroaryl.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: Etching is dry etching or wet etching. Preferred Properties: The solubility parameter of water-soluble resin of water-soluble resin film is more than 20 MPa1/2 and less than 26 MPa1/2. When the chemically-amplified-type photosensitive resin composition is exposed to light having wavelength of 365 nm at rate of 100 mJ/cm2 or more, then the polarity changes. The chemically-amplified-type photosensitive resin composition becomes slightly soluble with respect to organic solvent with the solubility parameter of less than 18 MPa1/2. Preferred Composition: The water-soluble resin of water-soluble resin film is polyvinyl alcohol and/or polyvinylpyrrolidone, preferably polyvinylpyrrolidone. The chemically-amplified-type photosensitive resin composition further contains resin containing cyclic ether-ester structure, resin containing a repeating unit containing furan-type group of formula (11), resin containing ester-type repeating unit of formula (B-1), and resin containing diester-type repeating unit of formula (B-2). The chemically-amplified-type photosensitive resin composition is negative.R1=H or alkyl;L1=carbonyl or phenylenyl;R21-R27=H or alkyl;R'1=H, alkyl, cyano or halo;R2-R4=alkyl;two of R2-R4=cyclic alkyl;andR5=bivalent linear hydrocarbyl.