NOVELTY - The method involves supplying chemical liquid with first temperature to a major surface of a substrate. Rinse liquid with second temperature lower than the first temperature is supplied to the surface of the substrate to rinse off liquid remaining on the substrate. Reaction liquid causing an exothermic reaction and having a liquid temperature lower than the first temperature and not less than the second temperature is supplied to the major surface of the substrate in a state in which the chemical liquid supplied to the substrate in the chemical liquid supplying step remains on the substrate.    USE - Method for processing a substrate. Uses include but are not limited to semiconductor wafer, LCD substrate, plasma display substrate, field emission display (FED) substrate, optical disk substrate, magnetic disk substrate, magneto-optical disk substrate, photomask substrate, ceramic substrate and solar cell substrate.    ADVANTAGE - The method enables rapid temperature decrease of the substrate to be suppressed to reduce amount of deformation of the substrate in comparison to a case in which rinse liquid having the second temperature lower than the first temperature is supplied to the substrate in succession to the supplying of the chemical liquid. The method enables temperature of the entire major surface of the substrate to decrease uniformly so that the deformation of the substrate due to temperature difference can be suppressed or prevented. The method enables suppressing deflection of the rotating substrate. The method enables reducing the supply flow rate of the processing liquid into the telescopic piping when in a state in which the telescopic piping is extended.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a substrate processing apparatus.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic block diagram of an interior of a chamber included in a substrate processing apparatus.    Controller (3)    Nozzle arm (12, 30)    Disk portion (50)    Infrared heater (58)    Heater arm (59)